Teknek to detail latest in web cleaning

Sheila Hamilton, Teknek’s technical director, has been invited to speak at the AIMCAL, the Association of International Metallizers, Coaters and Laminators, conference on the subject of substrate cleaning in a high-vacuum environment. 

The deposition of very thin functional films within a vacuum chamber is susceptible to particulate contamination on the substrate. Teknek has developed a new contact cleaning system that can operate within a high-vacuum environment without detriment to either the vacuum chamber operation or to the cleaning performance of the unit.

The paper will present the results of work carried out by Teknek with the Holst Centre in the Netherlands as part of the Clean4Yield program.

Hamilton said: ‘Results presented will include details of outgassing tests conducted on various different contact cleaning elastomers and adhesives within a high-vacuum chamber together with details of the cleaning performances of the elastomer both before and after vacuum exposure.

‘The best performing elastomer and adhesive were then incorporated into a special cleaning unit, designed specifically to operate at the unwind and rewind stations of a silicon nitride deposition tool for barrier film.’