GEW launches E4C
E4C offers the highest power available from the GEW range, to support the most demanding UV curing applications in the market.
E4C has a compact ‘E2C’ profile to fit the widest range of machines. It is versatile, controllable and safe for the widest range of heat-sensitive materials, whilst operating quietly with minimal air requirements.
E4C has optically tuned reflectors to maximise curing power. Its water-cooled reflectors support the highest UV power whilst limiting heat transfer to the substrate.
The system is available in widths of up to 130cm (51in) and can deliver power of up to 200W/cm, 40 percent higher than the E2C.
E4C is also LED-ready, with the hybrid lamp casing able to house either LW2 LED or E4C arc lamp cassettes. E4C is available with multi-point UV monitoring.
Furthermore, E4C is retrofittable on all E2C installations.
It is also compatible with inert atmosphere curing, doped lamps (Fe or Ga) and can be customized to suit specialist applications.
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