GEW launches EOS power and control system

New platform replaces Rhino infrastructure with end-to-end encrypted UV curing control.

GEW has confirmed it will launch its new EOS Power and Control System at Loupe Americas 2026 in Chicago at booth 3500, replacing the company's Rhino power infrastructure with a redesigned platform covering power supplies, control electronics, cabling and UV system control software.

EOS introduces intelligent serialized lampheads for improved telemetry and OEM integration, end-to-end encryption of all communications traffic and enhanced remote monitoring functionality. Standard features include hour and reflector counters, and the platform remains compatible with GEW's patented interchangeable ArcLED technology. In-house manufacturing of the new system gives GEW direct quality control over the full product.

Alongside EOS, GEW will introduce a new Air Blast Cooler and a DoseGuard Laboratory Unit, completing a three-product launch at the show.

'EOS will completely transform the functionality, capability and integration of our UV curing systems,' said Robert Rae, managing director at GEW. 'It brings a more seamless and ergonomic operator experience, and its superb connectivity enables a huge variety of control and I/O options to be integrated, creating more telemetry and data for enhanced analyses.'