GEW launches EOS power platform
New UV curing control system replaces RHINO infrastructure at Loupe Americas.
GEW has launched its EOS Power and Control Platform at Loupe Americas 2026 in Chicago at booth 3500, replacing the company's RHINO power infrastructure with a complete redesign of its power supplies, control electronics, cabling and UV system control software.
EOS introduces intelligent serialized lampheads for improved telemetry and OEM integration, end-to-end encryption of all communications traffic and enhanced remote monitoring functionality, with standard features including hour and reflector counters. The platform is fully compatible with GEW's patented interchangeable ArcLED technology. In-house manufacturing of the new system gives GEW direct quality control across the full product.
Alongside EOS, GEW is presenting its DoseGuard precision control system and a new Air Blast Cooler at the show.
'EOS will completely transform the functionality, capability and integration of our UV curing systems,' said Robert Rae, managing director of GEW. 'It brings a more seamless and ergonomic operator experience, and its superb connectivity enables a huge variety of control and I/O options to be integrated, creating more telemetry and data for enhanced analyses.'
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